The CS101 Cheongsam Sleeve Pattern Template is a professional pattern making tool designed to expand sleeve variations while maintaining a stable and accurate cheongsam base pattern. As an essential companion to the CS101 Cheongsam Basic Pattern Template, this system allows designers to create multiple cheongsam styles efficiently without altering the core structure of the garment.

This product offers three sleeve style options within one unified system. CS101-S1 is the sleeveless series, which includes three refined variations—CS101-S1A, CS101-S1B, and CS101-S1C—each achieved through subtle changes to the outer contour. CS101-S2 is the cap sleeve template, suitable for modern, fitted, or elegant cheongsam designs. CS101-S3 is the long sleeve template, ideal for classic and formal cheongsam silhouettes.
 

The sleeve template is designed to be used together with the CS101 Cheongsam Basic Pattern Template. By modifying only the outer sleeve outline while fully preserving the original darts and inner placket structure, designers can develop a wide range of cheongsam styles with consistent fit, balance, and construction accuracy. This approach minimizes repetitive drafting and ensures reliable pattern results across different designs.
 

Made from high-transparency plastic, the template allows clear visibility of underlying pattern lines for precise alignment and tracing. The multi-size integrated design combines multiple sizes into a single template, improving efficiency and reducing the need for multiple pattern sets. The material is thin yet flexible, offering durability and ease of handling during drafting, and can be rolled for compact storage, making it suitable for studios, classrooms, and on-the-go pattern work.

The CS101 Cheongsam Sleeve Pattern Template is ideal for professional pattern makers, fashion designers, educational use, sample development, and small-batch custom production. It provides a practical and systematic solution for creating diverse cheongsam sleeve styles while maintaining a consistent and professional pattern foundation.